Instrument Systems of the Konica Minolta Group introduces a camera-based measurement solution for µLED wafer testing that generates 2-dimensional, pixel-resolved optical analyses within given cycle times. The LumiTop 4000 can detect the smallest of defects and inhomogeneities on the wafer. Thanks to a 100 mm macro lens, the camera enables fast parallel inline analysis of all µLEDs on a wafer at a single test station.
For efficient testing of thousands of Micro LEDs on a wafer, the test procedure must be parallelized. The manufacturer is thus required to simultaneously contact as many µLEDs as possible. In addition, the optical inspection should be fast and accurate, and performed synchronous to the production flow. This functions only with a 2D measurement using specifically calibrated instruments to prevent measurement errors.
The LumiTop family from Instrument Systems offer a solution combining 2D camera with a spectroradiometer that serves as a simultaneous reference measuring instrument for highly accurate readings. The new LumiTop 4000 can be used for µLED wafer testing.
With a field of view (FoV) of approximately 1.0 by 1.4 cm, the new LumiTop 4000 can measure many thousands of Micro LEDs in parallel with a minimum pixel size as low as 30 μm.